304. PTB-Seminar
VUV and EUV Metrology
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No.
First author
Title
1
V. Deuter
EUV interference and proximity lithography
FZ Jülich
2
H. Lu
Reflection‐mode Coherent Diffraction Imaging using Laboratory Light Sources
RWTH
3
K. Jimenez
Optical And Structural Characterization Of Nb, Zr, Nb/Zr, Zr/Nb Thin Films On Si3N4 Membranes Windows
U Padova
4
N. A. Malik
EUV/FUV polarimetric study of Single layer graphene/SiO2 (285nm)/silicon
U Padova
5
K. Wiese
Determination of optical constants in the VUV by combining reflectometry and ellipsometry
PTB
6
R.W.E. van de Kruijs
In‐situ stress and in‐vacuo LEIS surface metrology of ultrathin film growth
U Twente
7
L. Bahrenberg
Compositional pellicle characterization by EUV reflectance and transmittance measurements
RWTH
8
D. Wilson
On space charge effects in laboratory based photoemission electron microscopy using compact gas discharge EUV sources
FZ Jülich
9
F. Melsheimer
Study of plasma dynamics and spectral tunability in hollow cathode triggered gas‐discharge sources
FZ Jülich
10
S. Glabisch
Spectral characterization of the EUV emission of a gas discharge plasma light source ignited by a high voltage trigger
RWTH
11
N. Böwering
Analysis of improvement potential of electrodeless discharge EUV light source for metrology
U Bielefeld
12
V. Zabrodskii
4H ‐ SiC detectors for VUV spectral range
Ioffe
13
A. Sokolov
An XUV At‐Wavelength Metrology facility at BESSY‐II for precision diffraction gratings
HZB
14
P. Baumgärtel
RAY‐UI: Extensions compared to RAY
HZB
15
F. Siewert
The new BESSY‐II Optics Laboratory ‐ a Facility for Measuring ultra‐precise XRay Optics
HZB
16
M. Bayraktar
Broadband spectrometer development based on high‐density free‐standing transmissiong gratings
MESA U Twente